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17th August 2024, 05:42 | #1 |
[M] Reviewer Join Date: May 2010 Location: Romania
Posts: 152,436
| Samsung to Install High-NA EUV Machines Ahead of TSMC in Q4 2024 or Q1 2025 Samsung Electronics is set to make a significant leap in semiconductor manufacturing technology with the introduction of its first High-NA 0.55 EUV lithography tool. The company plans to install the ASML Twinscan EXE:5000 system at its Hwaseong campus between Q4 2024 and Q1 2025, marking a crucial step in developing next-generation process technologies for logic and DRAM production. This move positions Samsung about a year behind Intel but ahead of rivals TSMC and SK Hynix in adopting High-NA EUV technology. The system is expected to be operational by mid-2025, primarily for research and development purposes. Samsung is not just focusing on the lithography equipment itself but is building a comprehensive ecosystem around High-NA EUV technology. https://www.techpowerup.com/325620/s...024-or-q1-2025 |
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