Stefan Mileschin

According to TechNews Taiwan, Intel has made significant progress in implementing ASML's cutting-edge High-NA EUV lithography technology. The company has successfully completed the assembly of its second High-NA "Twinscan EXE" EUV system at its Portland facility, as confirmed by Mark Phillips, Intel's Director of Lithography Hardware. Christophe Fouquet, CEO of ASML, highlighted that the new assembly process allows for direct installation at the customer's site, eliminating the need for disassembly and reassembly, thus saving time and resources. Phillips expressed enthusiasm about the technology, noting that the improvements offered by High-NA EUV machines have surpassed expectations compared to standard EUV systems. Given the massive $380 million price point of these High-NA systems, any savings are valuable in the process.

https://www.techpowerup.com/327720/i...e-installation