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ASML Delivers First 2nm-Generation Low-NA EUV Tool
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ASML Delivers First 2nm-Generation Low-NA EUV Tool
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14th March 2024, 08:32
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| [M] Reviewer  Join Date: May 2010 Location: Romania
Posts: 153,575
 |  ASML Delivers First 2nm-Generation Low-NA EUV Tool Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made using Low-NA EUV litho tools. This is why the latest announcement from ASML is particularly notable. As spotted by Computerbase, ASML this week has delivered its first updated Twinscan NXE:3800E lithography machine for fab installation. The latest iteration of the company's line of 0.33 numerical aperture (Low-NA) lithography scanners, the NXE:3800E is aimed at making chips on 2nm and 3nm-class technologies. https://www.anandtech.com/show/21297...twinscan-3800e |
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